Novel technique for RTP annealing of compound semiconductors

Materials Research Society Symposium - Proceedings

Volumn 483, Issue , 1997, Pages 345-353

  Fu, M ^a   Sarvepalli, V ^a   Singh, R K ^a   Abernathy, C R ^a   Cao, X ^a   Pearton, S J ^a   Sekhar, J A ^a  

^a Micropyretics Heaters Intl Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ENERGY GAP; HIGH TEMPERATURE EFFECTS; ION IMPLANTATION; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING SILICON;

ACTIVATION EFFICIENCY;

THIN FILMS;

EID: 0031365447     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)