GaN device processing

Materials Research Society Symposium - Proceedings

Volumn 482, Issue , 1997, Pages 961-972

  Pearton, S J ^a   Ren, F ^a   Zolper, J C ^a   Shul, R J ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; ELECTRIC INSULATORS; ELECTRIC RESISTANCE; ION IMPLANTATION; NITRIDES; OHMIC CONTACTS; PLASMA ETCHING; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING;

ALUMINUM NITRIDE; GALLIUM NITRIDE; INDIUM NITRIDE;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031365341     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-482-961     Document Type: Conference Paper

References (30)