New approach to global alignment in IC manufacturing based on a neural network model

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 629-642

  Ghazanfarian, Amir Aalam ^a   Pease, R Fabian W ^a   Chen, Xun ^a   McCord, Mark A ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNMENT; COMPUTER SIMULATION; INTEGRATED CIRCUIT MANUFACTURE; NEURAL NETWORKS; RANDOM PROCESSES; SPURIOUS SIGNAL NOISE;

OPTICAL MICROLITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0031365077     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.276056     Document Type: Conference Paper

References (5)