Studies of the evolution of the topography of selected materials as a function of etching in reactive and non-reactive r.f. plasmas

Surface and Coatings Technology

Volumn 97, Issue 1-3, 1997, Pages 151-157

  Anderson, C A ^a   Brown, N M D ^a   Cui, Naiyi ^a   Liu, Zhihui ^a   McKinley, A ^a   Walker, C G H ^a  

^a UNIVERSITY OF ULSTER   (United Kingdom)

Author keywords

Plasma etching; STM AFM; Topography of materials

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CRYSTAL LATTICES; GRAPHITE; MICA; MOLYBDENUM COMPOUNDS; OXYGEN; PRESSURE EFFECTS; SCANNING TUNNELING MICROSCOPY; SURFACE ROUGHNESS;

MOLYBDENUM DISULFIDE; MUSCOVITE; SURFACE TOPOGRAPHY;

PLASMA ETCHING;

EID: 0031364821     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00142-4     Document Type: Article

References (4)

1. Hong-Xing You, N.M.D. Brown, K.F. Al-Assadi, Surf. Sci. 284 (1993) 263.
2. Hong-Xing You, N.M.D. Brown, K.F. Al-Assadi, Surf. Sci. 279 (1992) 189.
3. N.M.D. Brown, Zhi-Hui Liu, Appl. Surf. Sci. 90 (1995) 155.
4. N.M.D. Brown, A. McKinley, Naiyi Cui, unpublished work.