Minimization of total overlay errors on product wafers using an advanced optimization scheme

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 362-373

  Levinson, Harry J ^a   Preil, Moshe E ^a   Lord, Patrick J ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNMENT; ERROR ANALYSIS; OPTIMIZATION; PHOTOLITHOGRAPHY; PROCESS CONTROL; SAMPLING; STATISTICAL METHODS;

OPTICAL MICROLITHOGRAPHY; OVERLAY ERRORS; WAFER STEPPERS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031364159     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275996     Document Type: Conference Paper

References (11)