Laser-processing for patterned and free-standing nitride films

Materials Research Society Symposium - Proceedings

Volumn 482, Issue , 1997, Pages 973-978

  Kelly, M K ^a   Ambacher, O ^a   Dimitrov, R ^a   Angerer, H ^a   Handschuh, R ^a   Stutzmann, M ^a  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; INTERFACES (MATERIALS); NITRIDES; PULSED LASER APPLICATIONS; PYROLYSIS; SEMICONDUCTING GALLIUM COMPOUNDS; TRANSPARENCY;

FREE STANDING FILMS; PATTERNED FILMS;

SEMICONDUCTING FILMS;

EID: 0031363674     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-482-973     Document Type: Conference Paper

References (11)