Zr-based films for attenuated phase-shift mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3096, Issue , 1997, Pages 354-361

  Matsuo, Tadashi ^a   Ohkubo, Kinji ^a   Haraguchi, Takashi ^a   Ueyama, Kohsuke ^a  

^a TOPPAN PRINTING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; FILMS; PHASE SHIFT; PHOTOLITHOGRAPHY; ROUGHNESS MEASUREMENT; SURFACES; ZIRCONIUM;

PHASE SHIFT MASKS;

MASKS;

EID: 0031363219     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.277280     Document Type: Conference Paper

References (8)