Effect of phase error on 180-nm and 250-nm grouped-line KrF lithography using an alternating phase-shift mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3096, Issue , 1997, Pages 375-382

  Petersen, John S ^a   Williams, Alvina ^a   Rich, Georgia K ^a   Miller, Daniel A ^a   Martinez Jr , Arturo M ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MONITORING; PHASE SHIFT; PHOTOLITHOGRAPHY; SIMULATION;

CRITICAL DIMENSIONS; PHASE ERRORS; PHASE-SHIFTUNG MASKS;

MASKS;

EID: 0031362765     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.277282     Document Type: Conference Paper

References (8)