Optimization of CMP defect detection schemes

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 1997, Pages

  Swecker, Aaron L ^a   Strojwas, Andrzej J ^a   Li, Xiaolei ^a   Levy, Ady ^a   Bell, Bobby ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; COMPUTER SIMULATION; CRYSTAL DEFECTS; INSPECTION; OPTIMIZATION;

CHEMICAL MECHANICAL POLISHING (CMP); FOURIER FILTERING;

SEMICONDUCTOR DEVICE TESTING;

EID: 0031361181     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)