Nanometer-scale lithography on the oligosilane Langmuir-Blodgett film

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 A, 1997, Pages 7312-7316

  Maruyama, Hiroyuki ^a   Kosai, Nobuyuki ^a   Sato, Tadatake ^a   Sagisaka, Shigehito ^a   Segawa, Hiroshi ^a,b   Shimidzu, Takeo ^a   Tanaka, Kazuyoshi ^a  

^a KYOTO UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

Gold substrate; Langmuir Blodgett film; Lithography; Oligosilane; Scanning tunneling microscope

Indexed keywords

ACETIC ACID; ELECTRIC FIELDS; ELECTRON BEAMS; LITHOGRAPHY; SCANNING TUNNELING MICROSCOPY; SILANES; SINGLE CRYSTALS; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

GOLD SUBSTRATES; NANOMETER SCALE LITHOGRAPHY; OLIGOSILANE; TRIDECAMETHYLHEXASILANYLACETIC ACID;

LANGMUIR BLODGETT FILMS;

EID: 0031360153     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7312     Document Type: Article

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