Structure of ion-beam-deposited B-C-N-O films and the role of oxygen

Journal of Materials Science Letters

Volumn 16, Issue 23, 1997, Pages 1910-1913

  Zhao, X A ^a,c   Ong, C W ^a   Ng, Y M ^a   Chan, K F ^a   Tsang, Y C ^a   Choy, C L ^a   Chan, P W ^a   Kwok, R W M ^b  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

^c SHANGHAI RESEARCH INSTITUTE OF MATERIALS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; BORON COMPOUNDS; CARBON; CHEMICAL BONDS; COMPOSITION; CRYSTAL STRUCTURE; DEPOSITION; ION BEAMS; MOLECULES; OXYGEN; SURFACES;

DUAL ION BEAM DEPOSITION; SUBSTRATE TEMPERATURE;

FILMS;

EID: 0031359945     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1018530515944     Document Type: Article

References (17)

1. H. EHRHARDT, Surf. Coatings Technol. 74-75 (1995) 29.
2. R. RIEDEL, Adv. Mater. 6 (1994) 549.
3. M. O. WATANABE, S. ITOH, K. MIZUSHIMA and T. SASAKI, Appl. Phys. Lett. 68 (1996) 2962.
4. Idem., J. Appl. Phys. 78 (1995) 2880.
5. A. W. MOORE, S. L. STRONG, G. L. DOLL, M. S. DRESSELHAUS, I. L. SPAIN, C. W. BOWERS, J. P. ISSI and L. PIRAUX, ibid. 65 (1989) 5109.
6. A. R. BADZIAN, S. APPENHEIMER, T. NIEMYSKI and E. OLKUSNIK, in Proceedings of the 3rd International Conference on Chemical Vapor Deposition, edited by F. A. Glaski (American Nuclear Society, Hinsdale, IL, 1972) p. 747.
7. A. DERRE, L. FILIPOZZI, F. BOUYER and A. MARCHAND, J. Mater. Sci. 29 (1994) 1589.
8. F. SAUGNAC, F. TEYSSANDIER and A. MARCHAND, J. Amer. Ceram. Soc. 75 (1992) 161.
9. K. MONTASSER, S. HATTORI and S. MORITA, J. Appl. Phys. 58 (1985) 3185.
10. L. MAYA and L. A. HARRIS, J. Amer. Ceram. Soc. 73 (1990) 1912.
11. D. A. SHIRLEY, Phys. Rev. B 5 (1972) 4707.
12. D. MARTON, K. J. BOYD, A. H. AL-BAYATI, S. S. TODOROV and J. W. RABALAIS, Phys. Rev. Lett. 73 (1994) 118.
13. M. OKAMOTO, H. YOLOYAMA and Y. OSAKA, Jpn. J. Appl. Phys. 29 (1990) 930.
14. W. DWORSCHAK, K. JUNG and H. EHRHARDT, Thin Solid Films 254 (1995) 65.
15. P. B. MIRKARIMI, K. F. MCCARTY, D. L. MEDLIN, W. G. WOLFER, T. A. FRIEDMANN, E. J. KLAUS, G. F. CARDINALE and D. G. HOWITT, J. Mater. Res. 9 (1994) 2925.
16. V. I. NEFEDOV, D. GATI, B. F. DZHURINSKII, N. P. SERGUSHIN and Y. V. SALYN, Zh. Neorg. Khim. 20 (1975) 2307.
17. S. M. SZE, "Semiconductor Devices Physics and Technology" (Wiley, New York, 1985) p. 335.