Characterization of Pb(Zr,Ti)O3 Thin films by MOCVD using the total reflection X-ray diffraction method

Integrated Ferroelectrics

Volumn 15, Issue 1-4, 1997, Pages 1-8

  Fujisawa, Hironori ^a   Shimizu, Masaru ^b   Shiosaki, Tadashi ^a  

^a KYOTO UNIVERSITY   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; FERROELECTRIC MATERIALS; FILM PREPARATION; LEAD COMPOUNDS; MAGNESIA; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLATINUM; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

TOTAL REFLECTION X RAY DIFFRACTION (TXRD) METHOD;

DIELECTRIC FILMS;

EID: 0031359882     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589708015691     Document Type: Article

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