Growth and nitridation of silicon-dioxide films on silicon-carbide

Materials Research Society Symposium - Proceedings

Volumn 470, Issue , 1997, Pages 413-418

  Sweatman, Denis ^a   Dimitrijev, Sima ^a   Li, Hui Feng ^a   Tanner, Philip ^a   Harrison, H Barry ^a  

^a GRIFFITH UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; ELECTRONIC DENSITY OF STATES; ENERGY GAP; FILM GROWTH; MOSFET DEVICES; NITRIDING; NITROGEN OXIDES; OXIDATION; SEMICONDUCTOR DOPING; SILICA; SILICON CARBIDE; SUBSTRATES;

ELECTRON MOBILITY;

SEMICONDUCTING FILMS;

EID: 0031359120     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-470-413     Document Type: Conference Paper

References (12)