Modeling the growth of PECVD silicon nitride films for crystalline silicon solar cells using factorial design and response surface methodology

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 1997, Pages 143-146

  Nybergh, Kjell ^a   Marjamaki, Teemu ^a   Skarp, Eija ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; FLOW OF FLUIDS; PLASMA APPLICATIONS; REFRACTIVE INDEX; SILANES; SILICON NITRIDE; THICKNESS MEASUREMENT;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); RESPONSE SURFACE METHODOLOGY (RSM);

SILICON SOLAR CELLS;

EID: 0031358354     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)