Diluted Wet Oxidation: A novel technique for ultra thin gate oxide formation

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 1997, Pages 49-52

  Tanabe, Yoshikazu ^a   Nakatsuka, Yasuhiko ^a   Sakai, Satoshi ^a   Miyazaki, Toru ^a   Nagahama, Toshiaki ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; OXIDATION; REACTION KINETICS; THIN FILM DEVICES; ULTRATHIN FILMS;

CATALYTIC SURFACE REACTIONS; DILUTED WET OXIDATION (DWO); ULTRA PURE WATER VAPOR GENERATORS; ULTRATHIN GATE OXIDES;

GATES (TRANSISTOR);

EID: 0031358315     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)