Influence of the sputtering parameters on the properties of Al2O3 and AlN insulators in spin tunneling junctions

Materials Research Society Symposium - Proceedings

Volumn 475, Issue , 1997, Pages 469-474

  Plaskett, T S ^a   Freitas, P P ^a   Sun, J J ^a   Sousa, R C ^a   da Silva, F F ^a   Galvao, T T P ^a   Pinho, N M ^a   Cardoso, S ^a   da Silva, M F ^a   Soares, J C ^a  

^a INESC   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELLIPSOMETRY; FERROMAGNETIC MATERIALS; MAGNETORESISTANCE; OXIDATION; PLASMAS; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SPUTTERING;

PLASMA OXIDATION; SPIN TUNNELING JUNCTION;

MAGNETIC THIN FILMS;

EID: 0031357671     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)