Formation of boron nitride films with various amounts of the cubic phase

Surface and Coatings Technology

Volumn 97, Issue 1-3, 1997, Pages 281-290

  Ullmann, J ^a   Heyden, D ^a   Schwarz, G ^a   Wolf, O K ^a   Baba, K ^b   Hatada, R ^b  

^a UNIVERSITY OF HEIDELBERG   (Germany)

^b Technology Center of Nagasaki   (Japan)

Author keywords

Cubic boron nitride; Ion assisted evaporation; Phase formation; Structure; Topography

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CUBIC BORON NITRIDE; EVAPORATION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HIGH TEMPERATURE OPERATIONS; PROTECTIVE COATINGS; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; X RAY DIFFRACTION ANALYSIS;

ION ASSISTED EVAPORATION; SURFACE TOPOGRAPHY;

BORIDE COATINGS;

EID: 0031357125     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00382-4     Document Type: Article

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