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Volumn 473, Issue , 1997, Pages 337-342
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Numerical simulations of electromigration and stress-driven diffusion in polycrystalline interconnects
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER SIMULATION;
DIFFUSION IN SOLIDS;
ELECTROMIGRATION;
FINITE ELEMENT METHOD;
GRAIN BOUNDARIES;
STRESSES;
STRESS DRIVEN DIFFUSION;
POLYCRYSTALLINE MATERIALS;
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EID: 0031356655
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-473-337 Document Type: Conference Paper |
Times cited : (12)
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References (7)
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