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Volumn 473, Issue , 1997, Pages 337-342

Numerical simulations of electromigration and stress-driven diffusion in polycrystalline interconnects

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFUSION IN SOLIDS; ELECTROMIGRATION; FINITE ELEMENT METHOD; GRAIN BOUNDARIES; STRESSES;

EID: 0031356655     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-473-337     Document Type: Conference Paper
Times cited : (12)

References (7)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.