Surface roughening of electrowon copper in the presence of chloride ions

TMS Annual Meeting

Volumn , Issue , 1997, Pages 51-62

  Ilgar, E ^a   O'Keefe, T J ^a  

^a MISSOURI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORIDE MINERALS; CURRENT DENSITY; ELECTRODEPOSITION; ELECTROLYTES; IONS; MORPHOLOGY; SURFACE ROUGHNESS;

ACID COPPER ELECTROLYTES;

COPPER METALLURGY;

EID: 0031355407     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (23)