In-situ high temperature X-ray diffraction study of Ni/Al2O3 interface reactions

Acta Materialia

Volumn 45, Issue 12, 1997, Pages 4917-4921

  Fujimura, Toru ^a   Tanaka, Shun Ichiro ^a  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ALUMINA; COOLING; INTERDIFFUSION (SOLIDS); NICKEL; REACTION KINETICS; THERMAL EFFECTS; THERMAL EXPANSION; X RAY DIFFRACTION ANALYSIS;

PARABOLIC RATE LAW; THERMAL EXPANSION COEFFICIENT;

INTERFACES (MATERIALS);

EID: 0031354577     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(97)00188-2     Document Type: Article

References (10)

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