Process-specific tuning of lithography simulation tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 491-498

  Mason, Mark E ^a   Soper, Robert A ^a   Terry, R Mark ^a   Mack, Chris A ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FILMS; OPTIMIZATION; PHOTORESISTS;

OPTICAL MICROLITHOGRAPHY; PROCESS-SPECIFIC TUNING;

PHOTOLITHOGRAPHY;

EID: 0031353269     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275981     Document Type: Conference Paper

References (8)