New low temperature processing of sol-gel SrBi2Ta2O9 thin films

Integrated Ferroelectrics

Volumn 14, Issue 1-4, 1997, Pages 123-131

  Ito, Yasuyuki ^a   Ushikubo, Maho ^a   Yokoyama, Seiichi ^a   Matsunaga, Hironori ^a   Atsuki, Tsutomu ^b   Yonezawa, Tadashi ^b   Ogi, Katsumi ^b  

^a SHARP CORPORATION   (Japan)

^b MITSUBISHI MATERIALS CORPORATION   (Japan)

Author keywords

Electrical properties; Film orientation; Film synthesis; Pulsed laser ablation; Strontium bismuth tantalate

Indexed keywords

ANNEALING; CRYSTALLIZATION; CURRENT DENSITY; LASER ABLATION; LASER PULSES; LEAKAGE CURRENTS; LOW TEMPERATURE OPERATIONS; PLATINUM COMPOUNDS; SOL-GELS; STRONTIUM COMPOUNDS; SYNTHESIS (CHEMICAL); THIN FILMS;

STRONTIUM BISMUTH TANTALATE;

DIELECTRIC FILMS;

EID: 0031351726     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589708019984     Document Type: Article

References (17)

1. S. Y. Wu, IEEE Trans. Electron. Devices, Vol. ED-21. No.8, 499 (1974).
2. W. I. Kinney, W. Shepherd, W. Miller, J. Evans, and R. Womack, Technical Digest of the IEDM, 850 (1987).
3. S. S. Eaton, D. B. Butler, M. Parris, D. Wilson, and H. McNeillie, IEEE ISSCC Technical Digest, 130 (1988).
4. J. F. Scott and C. A. Paz de Araujo, Science, 246, 1400 (1989).
5. J. T. Evans and R. Womack, IEEE J. Solid-State Circuits, SSC-23, 1171 (1988).
6. H. M. Duiker, P. D. Beale, J. F. Scott, C. A. Paz de Araujo, B. M. MeInick, J. D. Cuchiaro, and L. D. McMillan, J. Appl. Phys., 68, 5783 (1990).
7. B. M MeInick, C. A. Paz de Araujo, L. D. McMillan, D. A. Carver, and J. F. Scott, Ferroclectrics, 116, 79 (1991).
8. T. Mihara, C. A. Paz de Araujo, H. Watanabe, H. Yoshimori, B. McInick, and L. D. McMillan, Proc. 3rd ISIF, 116 (1991).
9. R. D. Nasby, J. R. Schwank, M. S. Rodgers, and S. L. Miller, Proc. 3rd ISIF, 376 (1991).
10. T. Mihara, H. Watanabe, and C. A. Paz de Araujo, Jpn. J. Appl. Phys., 33, 3996 (1994).
11. C. A. Paz de Araujo, J. D. Cuchiaro, L. D. McMillan, M. C. Scott, and J. F. Scott, Nature, 374, 627 (1995).
12. T. Mihara, H. Watanabe, C. A. Paz de Araujo, J. Cuchiaro, M. Scott, and M. D. McMillan, Proc. 4th ISIF, 137 (1992).
13. T. Li, Y. Zhu, S. B. Desu, C. H. Peng, and M. Nagata, Appl. Phys. Lett., 68(5), 616, (1996).
14. T. Kijima, S. Satoh, H. Matsunaga, and M. Koba, Jpn. J. Appl. Phys., 35, 79 (1996).
15. K. Amanuma, T. Hase, and Y. Miyasaka, Appl. Phys. Lett., 66(2), 221 (1995).
16. S. Ohnishi, K. Ishihara, Y. Ito, S. Yokoyama, J. Kudo, and K. Sakiyama, Technical Digest of the IEDM94, 843 (1994).
17. T. Atsuki, N. Soyama, T. Yonezawa, and K. Ogi, Jpn. J. Appl. Phys., 34, 5096 (1995).