Amorphous silicon-carbon alloys and amorphous carbon from direct methane and ethylene activation by ECR

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 627-632

  Conde, J P ^a   Chu, V ^a   Giorgis, F ^a   Pirri, C F ^a   Arekat, S ^a  

^a INSTITUTO SUPERIOR TÉCNICO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; ELECTRONIC DENSITY OF STATES; ENERGY GAP; ETHYLENE; HYDROGEN; METHANE; PLASMAS; SILANES;

AMORPHOUS CARBON; AMORPHOUS SILICON CARBON ALLOY; BANDGAP; DEPOSITION RATE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPIN DENSITY; SUBGAP DENSITY OF STATE;

AMORPHOUS FILMS;

EID: 0031351338     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-627     Document Type: Conference Paper

References (9)