New CVD film formation process using ionization of TEOS

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 1997, Pages 103-105

  Adachi, Motoaki ^a   Hayasi, Tadao ^a   Fujimoto, Toshiyuki ^a   Okuyama, Kikuo ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; IONIZATION OF SOLIDS; SEMICONDUCTING FILMS; SURFACE DISCHARGES;

COULOMBIC FORCE; NANOMETER SIZED PARTICLES; SOURCE MOLECULES;

MICROELECTRONIC PROCESSING;

EID: 0031349188     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)