Thermal desorption behavior of adsorbed materials on wafer surfaces

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 1997, Pages

  Jimbo, Tomoko ^a   Sakai, Satoshi ^a   Katuyama, Kiyomi ^a   Ito, Masaki ^a   Tomioka, Hideki ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MASS SPECTROMETRY; SILICON WAFERS; TEMPERATURE PROGRAMMED DESORPTION;

ORGANIC CONTAMINATION GASES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031349185     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)