Dry etching of bottom anti-reflective-coat and its application to gate length control

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 1997, Pages

  Nishizawa, A ^a   Tokashiki, K ^a   Horiba, S ^a   Miyamoto, H ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; DRY ETCHING; PLASMA APPLICATIONS;

ORGANIC BOTTOM ANTIREFLECTIVE COAT (BARC);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031348728     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)