Non-destructive and whole wafer characterization of III-V infrared epitaxial materials prepared by turbo disk metallorganic chemical vapor deposition

Materials Research Society Symposium - Proceedings

Volumn 484, Issue , 1997, Pages 13-18

  Feng, Z C ^a   Pelczynski, M ^a   Beckham, C ^a   Cooke, P ^a   Ferguson, I ^a   Stall, R A ^a  

^a EMCORE CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY MEASUREMENT; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; PHOTOLUMINESCENCE; SURFACES;

FOURIER TRANSFORM INFRARED REFLECTANCE; INFRARED EPITAXIAL MATERIALS;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 0031348247     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (18)