Design dependency of yield loss due to tungsten residues in spin on glass based planarization processes

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 1997, Pages 87-90

  Simon, P L C ^a   Maly, W ^a   de Vries, D K ^a   Bruls, E ^a  

^a NXP SEMICONDUCTORS   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EXTRACTION; PROCESS CONTROL; TUNGSTEN;

SPIN ON GLASS PLANARIZATION; STRINGERS; YIELD LOSS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031348042     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)