RIE nitrogen plasma-induced structural changes in thin SiO2 layers

Proceedings of the International Conference on Microelectronics

Volumn 2, Issue , 1997, Pages 617-620

  Atanassova, E ^a   Paskaleva, A ^a  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACES (MATERIALS); PLASMA ETCHING; REACTIVE ION ETCHING; SEMICONDUCTING FILMS; SEMICONDUCTOR DEVICE STRUCTURES; SILICA; SILICON WAFERS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

NITROGEN PLASMA;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0031347388     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)