Sub-quarter micron logic-gate-pattern fabrication using halftone phase-shifting masks

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7504-7511

  Otaka, Akihiro ^a   Kawai, Yoshio ^a  

^a NTT CORPORATION   (Japan)

Author keywords

Depth of focus; Halftone phase shifting mask; Isolated line pattern; Logic gate pattern; Off axis illumination; Transmittance

Indexed keywords

FOCUSING; LOGIC GATES; MASKS; OPACITY; OPTICAL RESOLVING POWER;

HALFTONE PHASE SHIFTING MASKS; LOGIC GATE PATTERN FABRICATION;

PHOTOLITHOGRAPHY;

EID: 0031346344     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7504     Document Type: Article

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