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Volumn 132, Issue 4, 1997, Pages 571-577

Sputtering and defect production by focused gold cluster ion beam irradiation of silicon

Author keywords

Cluster ions; Crystal defects; Focused ion beam; Radiation damage; Sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL DEFECTS; ION BEAMS; OPTICAL PROPERTIES; SILICON; SPUTTERING; SURFACE STRUCTURE;

EID: 0031344031     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00499-0     Document Type: Article
Times cited : (15)

References (31)
  • 28
    • 0040174761 scopus 로고
    • S. Coffa, G. Ferla, F. Briolo, E. Rimini (Eds.), Elsevier, Amsterdam
    • M. Wagner, S. Käpplinger, H.D. Geiler, in: S. Coffa, G. Ferla, F. Briolo, E. Rimini (Eds.), Ion Impl. Technol. 94, Elsevier, Amsterdam, 1995, p. 634.
    • (1995) Ion Impl. Technol. , vol.94 , pp. 634
    • Wagner, M.1    Käpplinger, S.2    Geiler, H.D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.