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Volumn 97, Issue 1-3, 1997, Pages 719-722

High-quality a-Si:H grown at high rate using an expanding thermal plasma

Author keywords

a Si:H; Expanding thermal plasma; Fast deposition

Indexed keywords

AMORPHOUS SILICON; ARGON; DEPOSITION; FILM GROWTH; GLOW DISCHARGES; HYDROGEN; HYDROGENATION; PLASMA JETS; PLASMA SOURCES;

EID: 0031343069     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00329-0     Document Type: Article
Times cited : (26)

References (13)
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    • (1993) J. Non-Cryst. Solids , vol.164-166 , pp. 31
    • Ganguly, G.1    Matsuda, A.2
  • 4
    • 0026918559 scopus 로고
    • G. Ganguly, A. Matsuda, J. Non-Cryst. Solids 164-166 (1993) 31; Jap. J. Appl. Phys. 31 (1992) L1269; Mater Res. Soc. Symp. Proc. 258 (1992); A. Matsuda, K. Nomoto, Y. Takeuchi, A. Suzuki, A. Yuuki, J. Perrin, Surf. Sci. 227 (1990) 50.
    • (1992) Jap. J. Appl. Phys. , vol.31
  • 5
    • 0027906879 scopus 로고
    • G. Ganguly, A. Matsuda, J. Non-Cryst. Solids 164-166 (1993) 31; Jap. J. Appl. Phys. 31 (1992) L1269; Mater Res. Soc. Symp. Proc. 258 (1992); A. Matsuda, K. Nomoto, Y. Takeuchi, A. Suzuki, A. Yuuki, J. Perrin, Surf. Sci. 227 (1990) 50.
    • (1992) Mater Res. Soc. Symp. Proc. , vol.258
  • 8
    • 0022987138 scopus 로고
    • A. Gallagher, Mater Res. Soc. Symp. Proc. 70 (1986) 3; J. Perrin, Y. Takeda, N. Hirano, Y. Takeuchi, A. Matsuda, Surf. Sci. 210 (1989) 114.
    • (1986) Mater Res. Soc. Symp. Proc. , vol.70 , pp. 3
    • Gallagher, A.1
  • 12
    • 0000083104 scopus 로고
    • D.D. Koleske, S.M. Gates, B. Jackson, J. Chem. Phys. 101 (1994) 3301; W. Widdra, S.I. Yi, R. Maboudian, G.A.D. Briggs, Weinberg, Phys. Rev. Lett. 74 (1995) 2074.
    • (1994) J. Chem. Phys. , vol.101 , pp. 3301
    • Koleske, D.D.1    Gates, S.M.2    Jackson, B.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.