Cross sectional TEM sample preparation using e-beam lithography and reactive ion etching

Materials Research Society Symposium - Proceedings

Volumn 480, Issue , 1997, Pages 217-224

  Cho, Hyun Jin ^a   Griffin, Peter B ^a   Plummer, James D ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; MOSFET DEVICES; REACTIVE ION ETCHING; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING SILICON; SEMICONDUCTOR SUPERLATTICES; SPECIMEN PREPARATION; TRANSMISSION ELECTRON MICROSCOPY;

CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY (XTEM); HIGH RESOLUTION ELECTRON MICROSCOPY (HREM);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031341495     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-480-217     Document Type: Conference Paper

References (5)