Comparison of defect size distributions based on electrical and optical measurement procedures

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

Volumn , Issue , 1997, Pages 277-282

  Hess, Christopher ^a   Weiland, Larg H ^a  

^a UNIVERSITY OF KARLSRUHE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

INSPECTION; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR DEVICE STRUCTURES;

DEFECT SIZE DISTRIBUTIONS; HARP TEST STRUCTURE; OPTICAL MEASUREMENT PROCEDURES; OPTICAL WAFER INSPECTION SYSTEMS; YIELD PREDICTION;

SEMICONDUCTOR DEVICE TESTING;

EID: 0031340902     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)