Effects of phase steps in e-beam written phase-masks used for fibre grating fabrication by near-field holography

IEE Conference Publication

Volumn , Issue 448 /1, 1997, Pages 187-190

  Williams, J A R ^a   Liu, X ^a   Everall, L A ^a   Bennion, I ^a   Aitchison, J S ^a   Thoms, S ^a   De La Rue, R M ^a  

^a ASTON UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; HOLOGRAPHY; MASKS; REFRACTIVE INDEX; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES;

FIBER BRAGG GRATINGS; NEAR FIELD HOLOGRAPHY (NFH);

DIFFRACTION GRATINGS;

EID: 0031340356     PISSN: 05379989     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)