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Volumn 469, Issue , 1997, Pages 3-12
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Defects and diffusion issues for the manufacturing of semiconductors in the 21st century
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER AIDED DESIGN;
COMPUTER SIMULATION;
DIFFUSION IN SOLIDS;
FERMI LEVEL;
INTERFACES (MATERIALS);
ION IMPLANTATION;
POINT DEFECTS;
SEMICONDUCTOR DOPING;
TECHNOLOGY COMPUTER AIDED DESIGN (TCAD);
SILICON ON INSULATOR TECHNOLOGY;
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EID: 0031340331
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-469-3 Document Type: Conference Paper |
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Times cited : (1)
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References (18)
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