Rapid thermal processing: When will it replace batch processing?

Materials Research Society Symposium - Proceedings

Volumn 470, Issue , 1997, Pages 147-157

  Pas, M F ^a   Pas, S D ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; NITRIDES; RANDOM ACCESS STORAGE; TEMPERATURE MEASUREMENT;

RAPID THERMAL CHEMICAL VAPOR DEPOSITION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031339902     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-470-147     Document Type: Conference Paper

References (17)