Electron emission characteristics of a-diamond coated field emitters

Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC

Volumn , Issue , 1997, Pages 527-531

  Choi, W B ^a   Ding, M Q ^a   Zhirnov, V V ^a   Myers, A F ^a   Hren, J J ^a   Cuomo, J J ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; DIAMOND FILMS; DOPING (ADDITIVES); ELECTRIC FIELD EFFECTS; ELECTRON TUNNELING; ENERGY GAP; MOLYBDENUM; NITROGEN; SILICON WAFERS; THERMAL EFFECTS;

AMORPHOUS DIAMOND COATED FIELD EMITTERS; CURRENT CONDITIONING;

FIELD EMISSION CATHODES;

EID: 0031339746     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)