Compaction of fused silica under low-fluence/long-term 193-nm irradiation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 116-121

  Smith, Charlene ^a   Borrelli, Nicholas F ^a   Allan, Douglas C ^a   Seward, Thomas P ^a  

^a USA ^*

Author keywords

[No Author keywords available]

Indexed keywords

COMPACTION; FINITE ELEMENT METHOD; FUSED SILICA; RADIATION EFFECTS; SEMICONDUCTOR DEVICE MANUFACTURE;

DENSIFICATION; OPTICAL MICROLITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0031339498     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275970     Document Type: Conference Paper

References (4)