Room-temperature migration of ion-implanted boron in silicon

Materials Research Society Symposium - Proceedings

Volumn 469, Issue , 1997, Pages 53-58

  Collart, E J H ^a   Weemers, K ^a   Gravesteijn, D J ^a   van Berkum, J G M ^a   Cowern, N E B ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ION IMPLANTATION; MOLECULAR BEAM EPITAXY; SEMICONDUCTING BORON;

BORON MIGRATION;

SEMICONDUCTING SILICON;

EID: 0031339420     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)