Processing parameter optimization for thermochemical writing of DOEs on chromium films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3010, Issue , 1997, Pages 168-179

  Cherkashin, Vadim V ^a   Churin, Evgeny G ^a   Korol'kov, Victor P ^a   Koronkevich, Voldemar P ^a   Kharissov, Andrey A ^a   Poleshchuk, Alexander G ^a   Burge, James H ^a  

^a INSTITUTE OF AUTOMATION AND ELECTROMETRY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; COMPUTER APPLICATIONS; ETCHING; FABRICATION; METALLIC FILMS; OPTIMIZATION; PHOTOSENSITIVITY; TECHNOLOGY;

COMPUTER-GENERATED HOLOGRAMS; DIFFRACTIVE OPTICAL ELEMENTS; THERMOCHEMICAL WRITING;

PHOTOLITHOGRAPHY;

EID: 0031339236     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)