Field emission from undoped polycrystalline diamond deposited by MPCVD at 520-665 C

Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC

Volumn , Issue , 1997, Pages 509-512

  Li, Yanbo ^a   Aslam, Dean M ^a   Kwon, Sang J ^a  

^a MICHIGAN STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; ELECTRIC CURRENTS; ELECTRON EMISSION; PLASMA APPLICATIONS; POLYCRYSTALLINE MATERIALS; SURFACE ROUGHNESS;

MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MPCVD);

DIAMOND FILMS;

EID: 0031339127     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (19)