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Volumn 469, Issue , 1997, Pages 323-328
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Chemical and electrochemical staining for two-dimensional dopant concentration profiling on ULSI silicon devices
a
a
CNR IMETEM
(Italy)
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Author keywords
[No Author keywords available]
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Indexed keywords
BIPOLAR TRANSISTORS;
FAILURE ANALYSIS;
SEMICONDUCTING BORON;
SEMICONDUCTOR DOPING;
SEMICONDUCTOR JUNCTIONS;
SILICON ON INSULATOR TECHNOLOGY;
TRANSMISSION ELECTRON MICROSCOPY;
ELECTROCHEMICAL STAINING;
TWO DIMENSIONAL DOPANT CONCENTRATION PROFILING;
ULSI CIRCUITS;
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EID: 0031338328
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-469-323 Document Type: Conference Paper |
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Times cited : (5)
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References (6)
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