Anomalous diffusion of ultra low energy boron implants in silicon

Materials Research Society Symposium - Proceedings

Volumn 469, Issue , 1997, Pages 59-63

  Webb, R P ^a   Foad, M A ^a   Gwilliam, R M ^a   Knights, A P ^a   Thomas, G ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPUTER SIMULATION; DIFFUSION IN SOLIDS; ION IMPLANTATION; MONTE CARLO METHODS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING BORON;

SOFTWARE PACKAGE SSUPREME; ULTRA LOW ENERGY BORON IMPLANTS;

SEMICONDUCTING SILICON;

EID: 0031338325     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-469-59     Document Type: Conference Paper

References (14)