Field electron emission from silicon tip arrays coated with nitrogen doped DLC films

Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC

Volumn , Issue , 1997, Pages 390-395

  Litovchenko, V G ^a   Evtukh, A A ^a   Klyui, N I ^a   Kudzinovski, S Yu ^a   Marchenko, R I ^a   Semenovich, V A ^a  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRON EMISSION; ETCHING; MATHEMATICAL MODELS; NITROGEN; OXIDATION; PLASMA APPLICATIONS; SILICON WAFERS;

DIAMOND LIKE CARBON (DLC) FILMS; FOWLER NORDHEIM PLOTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

FIELD EMISSION CATHODES;

EID: 0031338236     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)