High-sensitivity measurement of particles on SOI wafers

IEEE International SOI Conference

Volumn , Issue , 1997, Pages 182-183

  Naruoka, H ^a   Yoshida, Y ^a   Iwamatsu, T ^a   Yamaguchi, Y ^a   Ipposhi, T ^a   Yamamoto, H ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

NONDESTRUCTIVE EXAMINATION; PARTICLES (PARTICULATE MATTER); SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; X RAY ANALYSIS;

SEPARATION BY IMPLANTATION OF OXYGEN (SIMOX) WAFERS;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0031336948     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)