Manufacturable SOI CMOS process for low power digital, analog, and RF applications

IEEE International SOI Conference

Volumn , Issue , 1997, Pages 70-71

  Stuber, Michael ^a   Dennies, Paul ^a   Lyons, Gene ^a   Kobayashi, T ^a   Domyo, Hiroshi ^a  

^a Peregrine Semiconductor   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENT MEASUREMENT; EPITAXIAL GROWTH; FILM PREPARATION; GATES (TRANSISTOR); OSCILLATORS (ELECTRONIC); PHASE LOCKED LOOPS; SEMICONDUCTING FILMS; SHIFT REGISTERS; SILICON ON INSULATOR TECHNOLOGY; SILICON ON SAPPHIRE TECHNOLOGY; TRANSISTORS; ULTRATHIN FILMS;

HIGH TEMPERATURE OPERATING LIFE (HTOL); SINGLE SOLID PHASE EPITAXY (SSPE);

CMOS INTEGRATED CIRCUITS;

EID: 0031336082     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)