Characterization of self-patterned SrBi2Ta2O9 thin films from photo-sensitive solutions

Integrated Ferroelectrics

Volumn 16, Issue 1-4, 1997, Pages 41-52

  Uchida, H ^a   Soyama, N ^a   Kageyama, K ^a   Ogi, K ^a   Scott, M C ^b   Cuchiaro, J D ^b   Derbenwick, G F ^b   Mcmillan, L D ^b   Paz De Araujo, C A ^b  

^a MITSUBISHI MATERIALS CORPORATION   (Japan)

^b Symetrix Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BISMUTH COMPOUNDS; CAPACITORS; CURRENT DENSITY; ETCHING; LEAKAGE CURRENTS; MASKS; PEROVSKITE; PHOTOSENSITIVITY; SOLUTIONS; SUBSTRATES; ULTRAVIOLET RADIATION;

STRONTIUM BISMUTH TANTALUM OXIDE;

DIELECTRIC FILMS;

EID: 0031334252     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589708013028     Document Type: Article

References (9)

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6. R.Mozami et.al., Symp. On VLSI Tech. Dig, of Technical Papers, 55 (1994).
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8. Y.Nakao, T.Nakamura, A.Kamisawa, H.Takasu, N.Soyama, G.Sasaki,T. Atsuki, T.Yonezawa and K.Ogi, Proc.1995 Int.Symp.Appl.Ferroelectrics, 450 (1995).
9. N.Soyama, G.Sasaki, T.Atsuki, T.Yonezawa and K.Ogi, Jpn. J. Appl. Phys. 33, 5268 (1994).