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Volumn 470, Issue , 1997, Pages 99-107
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Selective Si/SiGe heterostructures for advanced CMOS and BiCMOS technologies
a
a
ORANGE LABS
(France)
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
CMOS INTEGRATED CIRCUITS;
FILM GROWTH;
MOLECULAR BEAM EPITAXY;
SEMICONDUCTING FILMS;
SEMICONDUCTING GERMANIUM COMPOUNDS;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DOPING;
SEMICONDUCTOR GROWTH;
THERMAL EFFECTS;
SILICON GERMANIDE;
HETEROJUNCTIONS;
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EID: 0031333963
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-470-99 Document Type: Conference Paper |
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Times cited : (2)
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References (17)
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