Influence of facility conditions on a ±0.25 °C repeatability lamp voltage controlled RTP system

Materials Research Society Symposium - Proceedings

Volumn 470, Issue , 1997, Pages 181-186

  Vandenabeele, Peter ^a   Renken, Wayne ^a  

^a SensArray Corp   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

COOLING WATER; HEAT RADIATION; QUARTZ; THERMAL CYCLING;

LAMP VOLTAGE; RAPID THERMAL PROCESSOR (RTP) LAMP BANK;

HEAT TREATMENT;

EID: 0031333534     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-470-181     Document Type: Conference Paper

References (2)